Method of detecting aberrations of an optical imaging system
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United States of America Patent
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Jun 19, 2001
Grant Date -
N/A
app pub date -
Sep 29, 1999
filing date -
Nov 23, 1998
priority date (Note) -
Expired
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Abstract
Aberrations of an imaging system can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure on a photoresist, developing the resist and scanning it with a scanning detection device which is coupled to an image processor. The circular phase structure is imaged in a ring structure and each of several possible aberrations, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour and the outer contour of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. The new method may be used for measuring a projection system for a lithographic projection apparatus.
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