Surface planarization of high temperature superconductors
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United States of America Patent
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Jun 26, 2001
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N/A
app pub date -
May 6, 1998
filing date -
May 8, 1997
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Abstract
Planarizing High Temperature Superconductor (HTS) surfaces, especially HTS thin film surfaces is crucial for HTS thin film device processing. Disclosed is a method of surface planarization for HTS film. The method includes first smoothing the HTS surface by Gas Cluster Ion Beam bombardment, followed by annealing in partial pressure of oxygen to regrow the damaged surface layer. A rough HTS surface can be planarized down to a smoothness with a standard deviation of one nanometer or better.
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