Exposure apparatus, output control method for energy source, laser device using the control method, and method of producing microdevice
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United States of America Patent
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Jun 26, 2001
Grant Date -
N/A
app pub date -
Aug 28, 2000
filing date -
Sep 9, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An exposure apparatus comprising an energy source which outputs a pulse exposure beam, a detector which detects energy of the exposure beam output from the energy source for every pulse, and a controller which controls energy of a pulse to be output next based on the energy of a pulse output prior to a latest output pulse detected by the detector.
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