Active shield for generating a plasma for sputtering
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United States of America Patent
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-
Jul 3, 2001
Grant Date -
N/A
app pub date -
Oct 8, 1996
filing date -
Oct 8, 1996
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A combination coil and shield for a plasma chamber in a semiconductor fabrication system is provided. The coil-shield has a plurality of turns to couple energy efficiently into a plasma and also substantially blocks deposition material from reaching a second shield positioned behind the first shield.
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