Method for developing front surface of substrate with improved developing function of developing solution and apparatus thereof
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United States of America Patent
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-
Jul 10, 2001
Grant Date -
N/A
app pub date -
Feb 3, 1999
filing date -
Feb 4, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
When the surface of a substrate is developed, a developing solution in low state of development function is supplied to the surface of the substrate. Thereafter, the development function of the supplied developing solution is improved. Thus, the surface of the substrate is developed. When the developing solution is supplied to the surface of the substrate, the developing solution does not develop the surface of the substrate. Thus, even if there is a time lag of the developing solution supplied on the surface, the surface of the substrate is equally developed.
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