Process liquid film forming apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 10, 2001
Issued Date -
N/A
app pub date -
Jun 16, 1999
filing date -
Nov 27, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for forming a film of a process liquid, comprising a mounting table for supporting the substrate to be processed substantially horizontally, a process liquid supply device for supplying a process liquid for processing the substrate, a linear nozzle having a header space which has a length substantially corresponding to a diameter of the substrate and a liquid discharge portion, the header space mutually communicating with the liquid discharge portion, a liquid inlet port which communicates with the process liquid supply device and whose opening is formed above the header space, a moving device for relatively moving the linear nozzle and the mounting table while the liquid discharge portion faces the substrate on the mounting table, and a control device for controlling a viscosity of the photoresist solution within the header space or controlling a temperature of the developing liquid in the header space.
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