Substrate cleaning apparatus and method
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United States of America Patent
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-
Jul 17, 2001
Grant Date -
N/A
app pub date -
Oct 6, 1998
filing date -
Oct 20, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A substrate cleaning apparatus includes a spin support for supporting and spinning a substrate, a nozzle for discharging a cleaning liquid with a given cleaning condition from a discharge opening, a moving mechanism for moving the nozzle at least between center and edge of the substrate, a cleaning condition adjuster for adjusting the cleaning condition, and a controller for controlling the cleaning condition adjuster to vary the cleaning condition according to a cleaning liquid supply position movable over the substrate surface.
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Cited Art Landscape
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