Rapid prototyping apparatus with enhanced thermal and/or vibrational stability for production of three dimensional objects
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United States of America Patent
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Jul 17, 2001
Grant Date -
N/A
app pub date -
Feb 8, 1999
filing date -
Feb 8, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A rapid prototyping and manufacturing (e.g. stereolithography) apparatus includes a secondary frame located within a primary frame of the system. The secondary frame defines an enclosure for housing a number of peripheral heat-producing components and peripheral vibration-producing components. The heat generated by these peripheral heat-producing components is substantially isolated in the enclosure and is removed from the primary frame so as not to cause an undesired impact on other components within the main frame. The secondary frame preferably sits directly on the floor or other surface without touching the primary frame, thus substantially avoiding transmittance of vibration from components in the enclosure to the primary frame of the system.
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