Heat treatment method, heat treatment apparatus and treatment system

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United States of America Patent

PATENT NO 6261365
SERIAL NO

09272782

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Abstract

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When a substrate coated with a coating solution which oxidizes at high temperatures is heat-treated, an oxygen concentration of a treatment atmosphere is lowered when the temperature is low. Next, the substrate is heat-treated in the treatment atmosphere of which the oxygen concentration is lowered. Sequentially, the treatment atmosphere is returned to that with the original oxygen concentration after the passage of a predetermined time after completing the heat treatment. Thereby, the substrate can be heat-treated, with the oxidization of the coating solution being controlled.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsuyama, Yuji Kikuchi-gun, JP 56 1243
Mizutani, Yoji Kawasaki, JP 16 694
Nagashima, Shinji Kikuchi-gun, JP 28 1219
Yonemizu, Akira Kumamoto, JP 23 1032

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