Reactor for processing a microelectronic workpiece

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6264752
SERIAL NO

09113435

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus for processing a microelectronic workpiece in a micro-environment is set forth. The apparatus includes a first chamber member having an interior chamber wall and a second chamber member having an interior chamber wall. The first and second chamber members are adapted for relative movement between a loading position in which the first and second chamber members are distal one another and a processing position in which the first and second chamber members are proximate one another to define a processing chamber. At least one workpiece support assembly is disposed between the first and second chamber members for supporting the microelectronic workpiece. The workpiece support assembly is operable to space the workpiece a first distance, x1, from an interior chamber wall of at least one of the first and second chamber members when the first and second chamber members are in the loading position and to space the workpiece a second distance, x2, from the interior chamber wall when the first and second chamber members are in the processing position, wherein x1>x2.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Curtis, Gary L 655 Hoffman Draw, Kila, MT 59920 55 1111
Thompson, Raymon F 286 Buffalo Hill Dr., Kalispell, MT 59901 81 2179

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