Developing apparatus and developing nozzle
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 31, 2001
Grant Date -
N/A
app pub date -
May 30, 2000
filing date -
May 31, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A developing apparatus comprises a table on which is disposed a substrate having a resist coating film formed thereon, a nozzle for supplying a developing solution to the substrate disposed on the table, a liquid supplying mechanism for supplying the developing solution to the nozzle, and a moving mechanism for relatively moving the nozzle and the substrate, wherein the nozzle includes a liquid inlet port communicating with the liquid supplying mechanism, a liquid reservoir for temporarily storing the developing solution supplied from the liquid supplying mechanism through the liquid inlet port, a narrow passageway communicating with the bottom portion of the liquid reservoir to cause pressure loss of the developing solution coming from the liquid reservoir, a linear liquid discharge section having a discharge port passageway communicating with the narrow passageway, and a buffering member arranged within the discharge port passageway and in the vicinity of the outlet port of the narrow passageway, the buffering member weakening the strength of the developing solution coming out of the narrow passageway so as to weaken the impact given by the developing solution discharged from the discharge port to the resist coating film.
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