Preparation of fluorine modified, low haze, titanium dioxide films
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 31, 2001
Grant Date -
N/A
app pub date -
May 19, 1999
filing date -
Jun 4, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention concerns the deposition of fluorine modified, titanium dioxide films (TiO.sub.2) onto hot glass by atmospheric pressure chemical vapor deposition (APCVD) using TiCl.sub.4 vapor. The invention is also suitable for depositing other metallic oxide films from their metallic halides such as SnCl.sub.4, GeCl.sub.4, and VCl.sub.4. The present invention provides a process that deposits a novel, fluorine modified, titanium dioxide film (TiO.sub.2) onto hot glass by atmospheric pressure chemical vapor deposition using TiCl.sub.4 vapor. The process uses injection of TiCl.sub.4 into a hot, nonoxygen containing carrier gas and blends the carrier gas and TiCl.sub.4 vapor with an oxygen containing gas stream containing a haze reducing quantity of a fluorine containing compound before contacting a surface of hot glass with the blended mixture. The process is capable of depositing a fluorine modified, TiO.sub.2 film at deposition rates exceeding 900 .ANG. per second. The crystalline phase of the fluorine modified film is essentially anatase. The film has a haze of less then 1% and a refractive index of greater than or equal to about 2.48. Also provided is an apparatus for practicing the process and a novel coated glass.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully