Microprocessor having air as a dielectric and encapsulated lines and process for manufacture

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United States of America Patent

PATENT NO 6268261
SERIAL NO

09185185

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A process for manufacturing a semiconductor circuit. The process comprises creating a plurality of adjacent conductive lines having a solid fill between the conductive lines; creating one or more layers above the lines and the fill; creating one or more pathways to the fill through the layers; and converting the fill to a gas that escapes through the pathways, leaving an air void between adjacent lines. To protect the lines from oxidation during processing, a related process for encapsulating conductive lines in one or more adhesion-promotion barrier layers may be performed. The encapsulation process may also be practiced in conjunction with other semiconductor manufacturing processes. The processes result in a multi-layer semiconductor circuit comprising conductive lines, wherein the lines have air as a dielectric between them, are encapsulated by an adhesion-promotion barrier layer, or both.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mih, Rebecca D Wappingers Falls, NY 18 190
Petrarca, Kevin S Newburgh, NY 117 1953

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