Spin-on glass anti-reflective coatings for photolithography
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United States of America Patent
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Jul 31, 2001
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N/A
app pub date -
Jun 10, 1999
filing date -
Jun 10, 1999
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Abstract
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths less than 260 nm such as 248 nm and 193 nm, that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.
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