Exposure apparatus and device manufacturing method including changing a photo-intensity distribution of a light source and adjusting an illuminance distribution on a substrate in accordance with the change
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 7, 2001
Issued Date -
N/A
app pub date -
Apr 24, 1995
filing date -
Feb 22, 1991
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An exposure apparatus and a device manufacturing method for transferring a device pattern on a substrate by illuminating the device pattern with light from a light source include features of changing a photointensity distribution of the light source and adjusting an illuminance distribution on the substrate in accordance with a change of the photointensity distribution.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully