Inspection technique of photomask
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United States of America Patent
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Aug 7, 2001
Issued Date -
N/A
app pub date -
Jul 18, 2000
filing date -
Feb 24, 1998
priority date (Note) -
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status (Latency Note)
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Abstract
An improved technique for inspecting photomasks employs simulated images of the resist pattern. A simulated image of an original pattern is compared to a simulated image generated from a pattern captured from a photomask manufactured from the original pattern. Alternatively, simulated images generated from captured data from two different instances of the same original pattern formed in a photomask are compared.
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