Method of and apparatus for processing substrate
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United States of America Patent
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-
Aug 14, 2001
Grant Date -
N/A
app pub date -
May 16, 1996
filing date -
May 18, 1995
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A blocking plate is disposed to face a substrate which is held by substrate holding device. A processing fluid is supplied to a surface of the substrate while supplying inert gas into a space between the substrate and the blocking plate. Since the inert gas flows along the surface of the substrate within the space between the substrate and the blocking plate, no turbulence which whirls upward is created at the surface of the substrate. This prevents the pollutants from adhering to the substrate and improves the quality of the substrate.
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