Method for sequentially depositing a three-dimensional network
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United States of America Patent
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Aug 21, 2001
Grant Date -
N/A
app pub date -
Jun 30, 1999
filing date -
Oct 19, 1995
priority date (Note) -
Expired
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Abstract
A method of producing radio frequency discharge plasma film layers having a three-dimensional functional film network. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-dimensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks provides means for significantly increasing the surface functional density.
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