Edge polishing composition

United States of America Patent

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Aug 28, 2001
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N/A
app pub date
Jun 2, 1999
filing date
Jun 5, 1998

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Abstract

An edge polishing composition for wafers, comprising water and silicon dioxide having an average particle size of from 70 to 2,500 nm.

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Patent Owner(s)

Patent Owner	Address
FUJIMI INCORPORATED	1-1 CHIRYO 2-CHOME NISHIBIWAJIMA-CHO KIYOSU-SHI AICHI 452-8502

International Classification(s)

C09K:MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED ....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Inoue, Yutaka	Aichi, JP	78	820
Kawase, Akihiro	Aichi, JP	4	73

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Edge polishing composition

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09323827

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PATENT NO	6280652
SERIAL NO	09323827
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09323827

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