Apparatus for removing photo-resist
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United States of America Patent
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-
Sep 4, 2001
Grant Date -
N/A
app pub date -
Jan 22, 1998
filing date -
Dec 24, 1997
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An apparatus for removing photo-resist. The apparatus comprises carriers for carrying a wafer, hot plates to remove residue solvent on the wafer, a cooling plate to decrease the wafer temperature, an reverse unit to turn over the wafer, a development unit to develop and remove photo-resist on the wafer, a top scrubbing unit to clean a top side of the wafer, and a back scrubbing unit to clean a back side of the wafer.
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