Method and apparatus for step and repeat exposures
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United States of America Patent
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-
Sep 4, 2001
Issued Date -
N/A
app pub date -
May 5, 1997
filing date -
Apr 26, 1995
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An excimer laser projection ablation system provides less than the necessary amount of illumination to a substrate to completely ablate a structure. The system then moves the substrate a distance less than the image field at the substrate and provides an additional level of illumination. The system continues to move the substrate and provide additional illumination until the structures are fully ablated. The method and system for performing an improved step and repeat process preferably are used to create uniform repeating structures or three-dimensional structures.
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