Illumination system and projection exposure apparatus using the same

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United States of America Patent

PATENT NO 6285440
SERIAL NO

09172165

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Abstract

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An illumination system for illuminating an illumination region having a difference in size along a first direction and a second direction perpendicular to the first direction. The illumination system includes an optical integrator having elements with different refractive powers with respect to the first and second directions as the optical integrator is viewed in an optical axis direction, the elements also having the same pitch with respect to the first and second directions, and an optical device for directing light from a light source upon the optical integrator at different largest incidence angles with respect to the first and second directions, so as to satisfy a relation 0.8<[(tan .theta..sub.1 /tan .theta..sub.2)/(.o slashed..sub.1 /.o slashed..sub.2)]<1.2 where .o slashed..sub.1 and .o slashed..sub.2 are largest incidence angles of the light incident on the optical integrator with respect to the first and second directions, and .o slashed..sub.1 and .o slashed..sub.2 are refractive powers of the optical integrator with respect to the first and second directions.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHAOHTA-KU TOKYO 146-8501

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takahashi, Kazuhiro Utsunomiya, JP 419 3644

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