Diffractive element in extreme-UV lithography condenser
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United States of America Patent
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Sep 4, 2001
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N/A
app pub date -
Jul 13, 2000
filing date -
Aug 6, 1998
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Abstract
Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.
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