Jet cleaning device for developing station
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 11, 2001
Grant Date -
N/A
app pub date -
Apr 28, 2000
filing date -
Mar 10, 2000
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A jet-cleaning device for a developing station is described, which jet-cleaning device is capable of removing chemical solution from the back surface of a silicon wafer without the need to perform time-consuming adjustment of knife ring position. The jet-cleaning device has a spin suction pad and a knife ring. The spin suction pad is used to support a silicon wafer. Inside the suction pad is a groove capable of delivering a jet of air onto the exposed wafer back surface so that dripping chemical solution can be blown away. The knife ring is erected under the wafer around the suction pad so that the sputtering of chemical solution back into the suction pad area is prevented.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully