Sputtering apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 11, 2001
Grant Date -
N/A
app pub date -
Nov 29, 1999
filing date -
Dec 2, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The chamber 1 of the spattering apparatus has a gas introduction port 2 provided at one side in a direction orthogonal to the opening/closing direction of a door 11 of chamber 1, and a vacuum evacuation port 3 provided on the other side of chamber. A substrate holder 4 is fixed on door 11, and a cathode 31 is arranged on a wall face facing door 11 of chamber 1. A shield 41 is arranged in close proximity to and so as to cover the peripheral part of substrate holder 4. A hole 42 is formed in shield 41 in a location facing vacuum evacuation port 3, whereby rapid vacuum evacuation can be achieved even though shield 41 is arranged in a condition close to sealing with respect to the peripheral part of substrate holder 4.
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