Apparatus and method of cleaning nozzle and apparatus of processing substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 11, 2001
Issued Date -
N/A
app pub date -
Feb 12, 2001
filing date -
May 19, 1998
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An apparatus of cleaning a nozzle comprising a mounting table for mounting a substrate to be processed, a process liquid nozzle having a liquid output portion for outputting a process liquid toward the substrate mounted on the table, a nozzle cleaning mechanism having a fluid spray portion for spraying a cleaning fluid onto the liquid output portion of the process liquid nozzle to remove an attached material from the liquid output portion by the cleaning fluid sprayed from the fluid spray portion, and a nozzle moving mechanism for moving the process liquid nozzle between the mounting table and the nozzle cleaning mechanism.
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Cited Art Landscape
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