Method for producing contact structures
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United States of America Patent
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Oct 2, 2001
Grant Date -
N/A
app pub date -
Nov 30, 1998
filing date -
Nov 30, 1998
priority date (Note) -
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Abstract
A production method for forming contact structures on a planar surface of a substrate and removing therefrom to mount the contact structures on a contact substrate. The contact structure is formed of a base beam which is attached to a surface of the contact substrate in a vertical direction, a horizontal beam which is connected to the base beam at one end, and a top beam formed on another end of the horizontal beam and is oriented in the vertical direction. The production method includes the steps of forming a sacrificial layer on a silicon substrate, forming, exposing and developing a photoresist layer, depositing conductive material on the photoresist layer to form the contact structures, and removing the photoresist layer and the sacrificial layer to separate the contact structures from the silicon substrate.
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