Lithographic projection apparatus with an alignment system for aligning substrate on mask
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United States of America Patent
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Oct 2, 2001
Grant Date -
N/A
app pub date -
Mar 6, 1998
filing date -
Mar 7, 1997
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Abstract
A lithographic projection apparatus with an off-axis alignment unit for aligning a substrate alignment mark (P1) with respect to a reference (RGP) is described. This unit comprises a structure (WEP) of deflection elements (80-86) which give the sub-beams having different diffraction orders coming from the diffractive substrate mark (P1) different directions so that these sub-beams are incident on separate reference gratings (90-96) and can be detected by separate detectors (DET). This unit also provides the possibility of aligning asymmetrical alignment marks with great accuracy.
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