Apparatus for analyzing multi-layer thin film stacks on semiconductors
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United States of America Patent
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Oct 2, 2001
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N/A
app pub date -
May 2, 2000
filing date -
Jan 29, 1998
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Abstract
An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement devices. Once calibration is completed, the system can be used to analyze multi-layer thin film stacks. In particular, the reference ellipsometer provides a measurement which can be used to determine the total optical thickness of the stack. Using that information coupled with the measurements made by the other optical measurement devices, more accurate information about individual layers can be obtained.
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