Electrode formation process

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United States of America Patent

PATENT NO 6299785
SERIAL NO

09296241

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Abstract

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A process for the preparation of an electrode, which comprises: (1) transferring a conductive paste layer supported on a base film to a substrate to form the conductive paste layer on the substrate; (2) forming a resist film on the conductive paste layer transferred to the substrate; (3) exposing the resist film through a mask to form a resist pattern latent image; (4) developing the exposed resist film to form a resist pattern; (5) etching exposed portions of the conductive paste layer to form a conductive paste layer pattern corresponding to the resist pattern; and (6) thermosetting the pattern to form a conductive layer pattern.

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Patent Owner(s)

Patent OwnerAddress
JSR CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bessho, Nobuo Kanagawa, JP 26 332
Masuko, Hideaki Mie, JP 18 249
Nemoto, Hiroaki Mie, JP 62 645
Shimokawa, Tsutomu Mie, JP 44 561

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