Method of forming resist film

United States of America Patent

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Oct 9, 2001
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N/A
app pub date
Nov 30, 1998
filing date
Dec 4, 1997

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Expired

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Abstract

A method of forming a resist film comprises (a) forming a resist film on a substrate, and (b) removing a surface region of the resist film formed in the step (a) so as to decrease the thickness of the resist film.

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Patent Owner(s)

Patent Owner	Address
TOKYO ELECTRON LIMITED	3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hirose, Keizo	Kofu, JP	28	1040
Konishi, Nobuo	Yamanashi-ken, JP	30	1167

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Method of forming resist film

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09200742

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PATENT NO	6300043
SERIAL NO	09200742
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09200742

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