Laser processing method
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United States of America Patent
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Oct 9, 2001
Issued Date -
N/A
app pub date -
Jul 19, 1995
filing date -
Jul 22, 1994
priority date (Note) -
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Abstract
In an annealing process of illuminating a semiconductor thin film with laser light, in the case where the laser illumination is performed at an energy level that is lower than an output energy range that allows a laser apparatus to operate most stably, the laser output is fixed somewhere in the above output energy range and the illumination energy is changed by inserting or removing a light attenuation filter into or from the laser illumination optical path. As a result, the time required for the laser processing can be shortened.
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