Photoresist coater
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Oct 16, 2001
Grant Date -
N/A
app pub date -
Nov 23, 1998
filing date -
Nov 23, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A photoresist coater has a rotatable chuck to support a substrate, a source of photoresist, a pivotable dispensing arm extendable over the chuck, and a nozzle at the end of the dispensing arm. The nozzle has an aperture with a dimension sufficiently small that photoresist directed therethrough forms an aerosol which is directed onto the substrate.
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