PROJECTION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD INCLUDING A PROJECTION OPTICAL SYSTEM HAVING A PAIR OF DIFFRACTIVE MEMBERS
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United States of America Patent
Stats
-
Oct 23, 2001
Grant Date -
Dec 6, 2001
app pub date -
Jun 22, 1999
filing date -
Jun 24, 1998
priority date (Note) -
Granted
status (Latency Note)
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Abstract
A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask onto a substrate, and the projection optical system includes a pair of diffractive members at least one of which can be displaced in a direction perpendicular to an optical axis of the projection optical system. Each of the pair of diffractive members has a diffractive surface whose shape is determined so that an optical characteristic of the pair of diffractive members varies when a positional relationship between the diffractive surfaces of the pair of diffractive members in the perpendicular direction varies, and an optical characteristic of the projection optical system is adjusted by displacing the at least one of the pair of diffractive members in the direction perpendicular to the optical axis.
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