Lithography chuck having piezoelectric elements, and method
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United States of America Patent
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-
Nov 6, 2001
Grant Date -
N/A
app pub date -
Apr 10, 2000
filing date -
Apr 10, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
A lithography chuck (100) holds a flat object (150), such as a semiconductor wafer (150) at the backside (152). The chuck has, supported on a base plate (105), a plurality of pins (110-n) to receive partial forces (F.sub.n) from the backside (152) and a plurality of piezoelectric elements (120-n) attached to the pins to sense the partial forces (F.sub.n) applied from the object (150) to the pins (110-n). The piezoelectric elements (120-n) apply partial displacements (B.sub.n) of the pins (110-n) to act on selected areas of the object (150) and thereby compensate for irregularities in the backside contour.
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