Liquid crystal display fabrication process using a final rapid thermal anneal

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6313901
SERIAL NO

09388054

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A process flow for forming a pixel cell for a light valve implements the furnace alloy/sintering step prior to deposition of the reflective metal layer from which the active pixel electrodes are to be formed. In this manner, the active pixel electrodes are spared loss of reflectance associated with prolonged exposure to high temperatures of the furnace alloy/sintering step. Adequate suppression of surface state charges created after the furnace alloy/sintering is ensured by performing a rapid thermal anneal at the conclusion of the process flow.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
NATIONAL SEMICONDUCTOR CORPORATION12500 TI BOULEVARD M/S 3999 DALLAS TX 75243

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cacharelis, Philip John Menlo Park, CA 5 91

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation