Micro-environment chamber and system for rinsing and drying a semiconductor workpiece
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United States of America Patent
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Nov 20, 2001
Grant Date -
N/A
app pub date -
Mar 13, 1998
filing date -
Mar 13, 1998
priority date (Note) -
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status (Latency Note)
Importance
Abstract
An apparatus for rinsing and drying a semiconductor workpiece in a micro-environment is set forth. The apparatus includes a rotor motor and a rinser/dryer housing. The rinser/dryer housing is connected to be rotated by the rotor motor. The rinser/dryer housing further defines a substantially closed rinser/dryer chamber therein in which rinsing and drying fluids are distributed across at least one face of the semiconductor workpiece by the action of centripetal acceleration generated during rotation of the housing. A fluid supply system is connected to sequentially supply a rinsing fluid followed by a drying fluid to the chamber as the housing is rotated.
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