System and method for performing low contamination extrusion for microelectronics applications
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United States of America Patent
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Nov 20, 2001
Grant Date -
N/A
app pub date -
Feb 17, 1999
filing date -
Feb 17, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
This invention relates to a system and method for performing accurate coating operations while minimizing contamination of the coating fluid arising from contact between the fluid and the extrusion head. In one embodiment, the extrusion head is composed entirely of non-metallic material, possibly ceramic, thereby minimizing any material removal by the fluid, and any ionic or chemical reaction between the extrusion head material and the fluid. In another embodiment, a shim separating metal parts of an extrusion head is composed of a non-metallic substance to prevent galvanic potential induced corrosion between the shim and the extrusion head material and the resulting release of the products of such corrosion into the coating fluid.
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