Cell projection mask
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United States of America Patent
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-
Nov 20, 2001
Grant Date -
N/A
app pub date -
Dec 23, 1999
filing date -
Dec 28, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A cell projection mask, comprising: a frame for supporting means; a membrane formed over the frame, for making a stress due to electron beam to maintain balance; and an absorber formed over the membrane, for absorbing or reflecting the electron beam, wherein the absorber is comprised of a silicon layer and includes at least one or more ion implanting layers.
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