Radiation sensitive resin composition
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United States of America Patent
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Nov 27, 2001
Grant Date -
Aug 16, 2001
app pub date -
Dec 20, 2000
filing date -
Dec 19, 1996
priority date (Note) -
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Abstract
A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): ##STR1## wherein R.sup.1, R.sup.2, R.sup.5, and R.sup.6 are an alkyl group , R.sup.3 and R.sup.7 are a hydroxyl group or --OR.sup.4 (wherein R.sup.4 is an organic group), A.sub.1.sup.- and A.sub.2.sup.- indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.
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