Tantalum sputtering target and method of manufacture

United States of America Patent

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Nov 27, 2001
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app pub date
May 21, 1999
filing date
May 27, 1998

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Abstract

Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.

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Patent Owner(s)

Patent Owner	Address
HONEYWELL INTERNATIONAL INC	855 SOUTH MINT STREET CHARLOTTE NC 28202

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
LaRue, Wesley	Ellwood City, PA	6	37
Ozturk, Bahri	Cranberry Township, PA	6	37
Rosenberg, Harry	Pittsburgh, PA	33	413
Wang, Guangxin	Cranberry Township, PA	15	52

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Tantalum sputtering target and method of manufacture

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09316777

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PATENT NO	6323055
SERIAL NO	09316777
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09316777

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