Method for two dimensional adaptive process control of critical dimensions during spin coating process

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United States of America Patent

PATENT NO 6327793
SERIAL NO

09531912

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A process for drying a polymeric material present on a substrate is provided. Temperatures of the polymeric material is measured and the ambient temperature in the vicinity of the substrate. A temperature of the substrate is also measured. A variation in the measured ambient temperature is detected. The substrate temperature, polymeric temperature, ambient temperature or a substrate drying spin speed is adjusted in response to the detected variation in the measured ambient temperature.

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Patent Owner(s)

  • ASML US, INC.;SILICON VALLEY GROUP, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gurer, Emir Scotts Valley, CA 23 305
Lee, Eddie Cupertino, CA 5 75
Lewellen, John W San Jose, CA 16 128
Zhong, Tom Santa Clara, CA 62 1341

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