Method for controlling a gas injector in a semiconductor processing reactor
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United States of America Patent
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-
Dec 11, 2001
Grant Date -
N/A
app pub date -
Feb 9, 2000
filing date -
Feb 9, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A single computer controls both a reactor and a gas jet assembly in a system. The gas jet assembly is mounted to the reactor such that a gas injector extends into the reactor. The gas injector includes a bent tip which extent at an angle away from the longitudinal axis of the gas injector. The gas jet assembly controls both the angular and longitudinal positions of the gas injector. By controlling the longitudinal position of the gas injector, the gas jet assembly controls the location at which process gas is introduced into the reactor. Further, by controlling the angular position of the gas injector, the gas jet assembly controls the direction in which process gas is introduced into the reactor.
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