Method for cleaning a polymer
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United States of America Patent
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-
Dec 11, 2001
Grant Date -
N/A
app pub date -
Nov 30, 1998
filing date -
Jun 9, 1998
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method for cleaning a polymer in a trench produced by a dry anisotropic etching process is disclosed. The method includes steps of introducing a gas into a trench for reacting with the polymer to form a volatile substance and removing the remaining polymer in the trench by a wet etching process. The gas is preferably a gaseous hydrofluoric acid to clean the polymer. Because the gas can enter the small hole of the deep trench easily, this method can completely remove the polymer in the trench.
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