Lithography system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Jan 1, 2002
Grant Date -
N/A
app pub date -
Jan 7, 2000
filing date -
May 26, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A lithography system includes a light source producing a light beam directed to a mask located in a mask level and an optical demagnifier for demagnifying by a factor and focusing the beam. The light beam is focused on a converter element for converting the beam in a further beam having a smaller wavelength than UV light. The beam at the mask level has a transversal size smaller than the desired resolution at the object level multiplied by the demagnifying factor.
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