Chemical-mechanical polishing apparatus and method
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United States of America Patent
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Jan 8, 2002
Grant Date -
N/A
app pub date -
Apr 10, 2000
filing date -
Jul 2, 1999
priority date (Note) -
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Abstract
A chemical-mechanical polishing (CMP) apparatus has a polishing head onto which a semiconductor wafer is fixed for holding the surface of the semiconductor wafer in contact with the surface of a polishing pad. The polishing head includes a wafer carrier and a retainer ring which guides the edges of the semiconductor wafer. The retainer ring has an opening through which air is supplied to the lower portion thereof, such that air is injected between the semiconductor wafer and the polishing pad through the opening before separating the semiconductor wafer from the polishing pad after the polishing process. The injected air reduces the adsorptive force between the semiconductor wafer and the polishing pad. Therefore, the semiconductor wafer can be easily separated from the polishing pad when the polishing head is raised.
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