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Abstract

A method for applying a diamond-like coating to at least one substrate includes arranging at least one substrate in a reaction chamber so that field lines extend between the at least one substrate and a ground electrode and perpendicularly intersect a clamping surface defined by the at least one substrate or the field lines perpendicularly intersect the clamping surface at an end of the at least one substrate closest to the clamping surface; and applying a diamond-like layer to the at least one substrate by plasma-enhanced chemical vapor deposition by exciting a deposition gas atmosphere with electromagnetic radiation and producing an electrical bias voltage between the substrate and at least one ground electrode.

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First Claim