Liquid photoimagable resist which is resistant to blocking
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United States of America Patent
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Jan 29, 2002
Issued Date -
N/A
app pub date -
Feb 5, 1996
filing date -
Sep 30, 1994
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A liquid applied photoresist composition is disclosed which exhibits a favorable balance of photospeed and overall physical properties. The photoresist composition includes a binder, a multifunctional monomer, a photoinitiator, and a solvent. The photoinitiator is present in the photoresist in an amount of greater than about 10% by weight of the photoresist without solvent. The photoresist when applied is relatively resistant to blocking when applied to a substrate. A process for producing a negative resist image on a surface using the photoresist is also disclosed.
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