Cleaning system using ultraviolet radiation and photoactivatable semiconductor material
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 5, 2002
Grant Date -
N/A
app pub date -
Feb 14, 2000
filing date -
Dec 23, 1996
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A cleaning system for cleaning a surface is proposed, the cleaning system having: a cleaning tool (2) with a working region (A) and with a UV-light source (7), the UV-radiation of which emerges from the tool (2) in the working region (A), and a cleaning agent which contains a photoactivatable semiconductor material (3), UV-radiation being fed directly into the photoactivatable semiconductor material (2) in the working region (A) via a light guide device (9, 14).
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully