Use of variable RF generator to control coil voltage distribution
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United States of America Patent
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Feb 12, 2002
Grant Date -
N/A
app pub date -
Aug 7, 1997
filing date -
Aug 7, 1997
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a plasma deposition system for depositing a film of sputtered target material on a substrate, the output of an RF generator coupled to a coil for generating a plasma can be varied during the deposition process so that heating and sputtering of the RF coil can be more uniform by 'time-averaging' RF voltage distributions along the RF coil.
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